Applied Materials社の請求項 #530

5225024
Applied Materials
A plasma etch or CVD reactor having a pair of electrodes for plasma processing comprising: plasma generation means for forming a plasma including energetic electrons near a major planar surface of a substrate mounted on a cathode, said plasma being selected to promote predetermined plasma processing at said surface; and magnetic confinement means for defining a cusp magnetic mirror region which at least partially confines said energetic electrons to a region near said major planar surface of said substrate and a permanent magnet disposed within said cathode to enhance said plasma processing.